SE-2000 Spectroscopic Ellipsometer
A non-destructive, optical technique used for the measurement of thin film thickness and optical functions, inclusive of complex multiplayer structures. Spectroscopic ellipsometry is based on the measurement of the change in the polarisation of light after reflection.
The instrument features a 300 x 300 mm vacuum stage suitable for ellipsometric measurement on both ridged and flexible samples directly. Its automatic stage control provides quick and easy mapping of samples up to these dimensions.
The instrument is fitted with a variable angle goniometer and features a fixed analyser and rotating compensator. This provides fast, accurate and reliable measurements over its wide spectral range; 190 nm to 1700 nm. Optics maybe selected from parallel beam, microspot (~ 400 µm) or ultra- microspot (~60 µm).
Additional configurations include Mueller matrix and spectroscopic photometry.