EVG 6200 Mask Aligner
Manual handling and exposure of 4inch & 6 inch round and 8 inch square substrates with manual alignment.
- Manual mask load.
- Proximity, soft and hard contact and vacuum contact modes.
- Nominal resolution from 0.5 microns (dependant on mode and resist system).
- Supports Nano-imprint exposure
- Optical filter for Su8 exposure and 365nm filter
- Align assist feature