The Aurion Etcher is an Reactive Ion Etching (RIE) plasma etching system with 2 Process chambers. It has O2, N2, Ar and CF4 process gases, with a spare line for an additional gas.
- Cassette to cassette transfer
- 2 Process chambers with a load lock
- Gases available are O2, CF4, Ar, N2
- Multi-Wavelength end-point detection system