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Aurion Etcher

The Aurion Etcher is an Reactive Ion Etching (RIE) plasma etching system with 2 Process chambers. It has O2, N2, Ar and CF4 process gases, with a spare line for an additional gas.

  • Cassette to cassette transfer
  • 2 Process chambers with a load lock
  • Gases available are O2, CF4, Ar, N2
  • Multi-Wavelength end-point detection system